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Developments in surface contamination and cleaning : fundamentals and applied aspects / edited by Rajiv Kohli and K. L. Mittal.

Contributor(s): Series: Developments in Surface Contamination and Cleaning Series ; volume 1Publisher: Amsterdam : Elsevier, 2016Edition: Second editionDescription: Vol. 1(xxii,873 pages) : illustrations ; 23 cmContent type:
  • text
Media type:
  • unmediated
Carrier type:
  • volume
ISBN:
  • 9780323299602
Subject(s): DDC classification:
  • 620.44 23 D489
Contents:
The Physical Nature of Very, Very Small Particles and its Impact on their Behavior / Othmar Preining -- Transport and Deposition of Aerosol Particles / Daniel J. Rader and Anthony S. Geller -- Relevance of Particle Transport in Surface Deposition and Cleaning / Chao-Hsin Lin and Chao Zhu -- Aspects of Particle Adhesion and Removal / David J. Quesnel, Donald S. Rimai, David M. Schaefer, Stephen P. Beaudoin, Aaron Harrison, Darby Hoss, Melissa Sweat, and Myles Thomas -- Tribological Implication of Particles / Koji Kato -- ESD Controls in Cleanroom Environments : Relevance to Particle Deposition / Larry Levit and Arnold Steinman -- Airborne Molecular Contamination : Contamination on Substrates and the Environment in Semiconductors and Other Industries / Taketoshi Fujimoto, Kikuo Takeda, and Tatsuo Nonaka -- Surface Analysis Methods for Contaminant Identification / David A. Cole, Sachin Attavar, and Lei Zhang -- Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles / Zhong Lin Wang and Jean L. Lee -- Wettability Techniques to Monitor the Cleanliness of Surfaces / Darren L. Williams and Kashmiri L. Mittal -- Cleaning with Solvents / John B. Durkee -- Removal of Particles by Chemical Cleaning / Philip G. Clark and Thomas J. Wagener -- The Use of Surfactants to Enhance Particle Removal from Surfaces / Michael L. Free -- Microabrasive Technology for Precision Cleaning and Processing / Rajiv Kohli -- Cleaning Using High-Speed Impinging Jet / Kuniaki Gotoh -- Carbon Dioxide Snow Cleaning / Robert Sherman -- Cleaning Using Argon/Nitrogen Cryogenic Aerosols / Wayne T. McDermott and Jeffery W. Butterbaugh -- Coatings for Prevention or Deactivation of Biological Contaminants / Joerg C. Tiller -- A Detailed Study of Semiconductor Wafer Drying / Wim Fyen, Frank Holsteyns, Twan Bearda, Sophia Arnauts, Jan Van Steenbergen, Geert Doumen, Karine Kenis, and Paul W. Mertens.
Item type: كتاب
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Item type Current library Call number Status Notes Date due Barcode
كتاب كتاب Central Library المكتبة المركزية 620.44 D489 (Browse shelf(Opens below)) Available قاعة الكتب 35470
كتاب كتاب Central Library المكتبة المركزية 620.44 D489 (Browse shelf(Opens below)) Available قاعة الكتب 39929

Includes bibliographical references and index.

The Physical Nature of Very, Very Small Particles and its Impact on their Behavior / Othmar Preining -- Transport and Deposition of Aerosol Particles / Daniel J. Rader and Anthony S. Geller -- Relevance of Particle Transport in Surface Deposition and Cleaning / Chao-Hsin Lin and Chao Zhu -- Aspects of Particle Adhesion and Removal / David J. Quesnel, Donald S. Rimai, David M. Schaefer, Stephen P. Beaudoin, Aaron Harrison, Darby Hoss, Melissa Sweat, and Myles Thomas -- Tribological Implication of Particles / Koji Kato -- ESD Controls in Cleanroom Environments : Relevance to Particle Deposition / Larry Levit and Arnold Steinman -- Airborne Molecular Contamination : Contamination on Substrates and the Environment in Semiconductors and Other Industries / Taketoshi Fujimoto, Kikuo Takeda, and Tatsuo Nonaka -- Surface Analysis Methods for Contaminant Identification / David A. Cole, Sachin Attavar, and Lei Zhang -- Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles / Zhong Lin Wang and Jean L. Lee -- Wettability Techniques to Monitor the Cleanliness of Surfaces / Darren L. Williams and Kashmiri L. Mittal -- Cleaning with Solvents / John B. Durkee -- Removal of Particles by Chemical Cleaning / Philip G. Clark and Thomas J. Wagener -- The Use of Surfactants to Enhance Particle Removal from Surfaces / Michael L. Free -- Microabrasive Technology for Precision Cleaning and Processing / Rajiv Kohli -- Cleaning Using High-Speed Impinging Jet / Kuniaki Gotoh -- Carbon Dioxide Snow Cleaning / Robert Sherman -- Cleaning Using Argon/Nitrogen Cryogenic Aerosols / Wayne T. McDermott and Jeffery W. Butterbaugh -- Coatings for Prevention or Deactivation of Biological Contaminants / Joerg C. Tiller -- A Detailed Study of Semiconductor Wafer Drying / Wim Fyen, Frank Holsteyns, Twan Bearda, Sophia Arnauts, Jan Van Steenbergen, Geert Doumen, Karine Kenis, and Paul W. Mertens.