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	1.		Materials and processes for next generation lithography / edited by Alex Robinson, Richard Lawson. by Robinson, Alex Lawson, Richard Series: Frontiers of nanoscience ; v. 11.Publisher: Amsterdam : Elsevier, [2016] Availability: Items available for loan: Central Library المكتبة المركزية (1). Add to cart (remove)
	2.		Nanostructured thin films : fundamentals and applications / edited by Maria Benelmekki, Andreas Erbe. by Benelmekki, Maria [editor.] Erbe, Andreas [editor.] Series: Frontiers of nanoscience ; v. 14.Publisher: Armsterdam, Netherlands ; Cambridge, MA, United States : Elsevier, [2019] Availability: Items available for loan: Central Library المكتبة المركزية (1). Add to cart (remove)

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